GDS2GOO scientific mask conversion workspace
Open a GDSII layout or try the UV example to preview it at physical scale.
GDS/GDSII · maximum 25 MB; hierarchy expansion is budgetedPreview data summary
No selected geometry is available for preview or export.
Keyboard inspection point: pixel 4260, 2160.
GDS2GOO · EXPERIMENT RECORD
UV exposure run sheet
Elegoo Mars 4 9K
405 nm · 18 µm pixel
- Source
- —
- GDS SHA-256
- Not applicable
- Top cell / layers
- Generated pattern · —
- Exposure
- 9 s
- Placement
- center · X 0 µm · Y 0 µm · 0°
- Orientation
- Exposed geometry
- Layout / minimum feature
- — · —
- Step-and-repeat
- 1 × 1 · pitch X 0 µm · Y 0 µm
- Substrate
- 2-inch wafer · Ø50.8 mm · X 0 µm · Y 0 µm · 0° · edge 3 mm
- Exported guides
- no outline · crosses marks
- Layer exposures
- —
- Photoresist / thickness
- — · —
- Soft bake
- —
- Development
- —
- Notes
- —
Pre-exposure verification
□ GOO opens in UVtools as 8520 × 4320 px and one layer.
□ Orientation, corner markers and polarity match the intended mask.
□ Dry LCD exposure completed without substrate or photoresist.
□ Resist batch, substrate ID and process conditions recorded.
Experimental result
Date: ____________________________________ Operator: ____________________________________
Observed linewidth / outcome: __________________________________________________________________________
Deviations and next dose: ______________________________________________________________________________